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\begin{document}

\title{Interference in Photo-detachment of tri-atomic negative ion near a hard
reflecting surface}



\author[1]{Farooq Khan}%
\author[1]{Habib  Rehman}%
\author[1]{Syed Asif}%
\author[1]{MUHAMMAD   KHAN}%
\author[2]{Muhammad Khan}%
\affil[1]{BUITEMS}%
\affil[2]{Khwaja Farid University of Engineering and Information Technology}%


\vspace{-1em}



  
  \date{May 22, 2024}


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\begin{abstract}
The phenomena in which an extra electron is removed from a negative ion
is called photo-detachment. Photo-detachment is important phenomena,
used to find the structure of anions, particulary to find the electron
affinities. In this paper, we present theoretically the induced efffects
in the photo-detached of tri-atomic anion H3 near hard reflecting wall
or surface. For the photo-detachment process, a Z-polarized coherent
source of radiations (laser) is used to kick electrons from H3 like
anion in the domain of a hard reflecting surface. Imaging method is
adopted to derive the generalized detached electron wave, differential
cross-section and the total cross-section Analytically. Numerical
solutions (simulations) for total electron flux and the total
cross-section is also presented. In the electron flux, shows visible
oscillation and hence the induced effect of surface in the interference.
It is depicted that the reflecting hard wall strongly affects the flux
and total photo-detachment cross-section%
\end{abstract}%



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